Elaheh Ahmadi

Elaheh Ahmadi

University of Michigan

H-index: 31

North America-United States

About Elaheh Ahmadi

Elaheh Ahmadi, With an exceptional h-index of 31 and a recent h-index of 25 (since 2020), a distinguished researcher at University of Michigan, specializes in the field of Nitrides and Oxides electronic devices.

His recent articles reflect a diverse array of research interests and contributions to the field:

Investigation of ALD HfSiOx as gate dielectric on β-Ga2O3 (001)

Diluted disilane as silicon source for uniform and controllable n-type doping of Ga2O3 via molecular beam epitaxy

Demonstration of controllable Si doping in N-polar AlN using plasma-assisted molecular beam epitaxy

Comparative analysis of selective area grown Ga-and N-polar InGaN/GaN nanowires for quantum emitters

Thermal stability of HVPE-grown (0001) α-Ga2O3 on sapphire template under vacuum and atmospheric environments

Electrical and Structural Analysis of β‐Ga2O3/GaN Wafer‐Bonded Heterojunctions with a ZnO Interlayer

Selective-area growth of GaN and AlGaN nanowires on N-polar GaN templates with 4° miscut by plasma-assisted molecular beam epitaxy

Demonstration of N-Polar GaN MIS-HEMT with High-k Atomic Layer Deposited HfO2 as Gate Dielectric

Elaheh Ahmadi Information

University

Position

Assistant Professor

Citations(all)

3580

Citations(since 2020)

2918

Cited By

1718

hIndex(all)

31

hIndex(since 2020)

25

i10Index(all)

62

i10Index(since 2020)

58

Email

University Profile Page

Google Scholar

Elaheh Ahmadi Skills & Research Interests

Nitrides and Oxides electronic devices

Top articles of Elaheh Ahmadi

Investigation of ALD HfSiOx as gate dielectric on β-Ga2O3 (001)

Applied Physics Letters

2024/3/25

Xin Zhai
Xin Zhai

H-Index: 6

Kai Sun
Kai Sun

H-Index: 10

Elaheh Ahmadi
Elaheh Ahmadi

H-Index: 21

Diluted disilane as silicon source for uniform and controllable n-type doping of Ga2O3 via molecular beam epitaxy

2024/3/16

Elaheh Ahmadi
Elaheh Ahmadi

H-Index: 21

Demonstration of controllable Si doping in N-polar AlN using plasma-assisted molecular beam epitaxy

Applied Physics Letters

2024/2/5

Cindy Lee
Cindy Lee

H-Index: 32

Elaheh Ahmadi
Elaheh Ahmadi

H-Index: 21

Comparative analysis of selective area grown Ga-and N-polar InGaN/GaN nanowires for quantum emitters

AIP Advances

2024/2/1

Thermal stability of HVPE-grown (0001) α-Ga2O3 on sapphire template under vacuum and atmospheric environments

Journal of Vacuum Science & Technology A

2023/7/1

Electrical and Structural Analysis of β‐Ga2O3/GaN Wafer‐Bonded Heterojunctions with a ZnO Interlayer

Advanced Electronic Materials

2023/6/27

Selective-area growth of GaN and AlGaN nanowires on N-polar GaN templates with 4° miscut by plasma-assisted molecular beam epitaxy

Journal of Crystal Growth

2023/6/1

Demonstration of N-Polar GaN MIS-HEMT with High-k Atomic Layer Deposited HfO2 as Gate Dielectric

Journal of Electronic Materials

2023/4

Type-II band alignment for atomic layer deposited HfSiO4 on α-Ga2O3

Journal of Vacuum Science and Technology A

2023/3/1

Si doping of β-Ga2O3 by disilane via hybrid plasma-assisted molecular beam epitaxy

Applied Physics Letters

2023/2/20

Uniform and controlled Si doping of Ga2O3 by disilane via hybrid molecular beam epitaxy

APS March Meeting Abstracts

2023

Elaheh Ahmadi
Elaheh Ahmadi

H-Index: 21

Kamruzzaman Khan
Kamruzzaman Khan

H-Index: 3

N-polar GaN: Epitaxy, properties, and device applications

2023/1/1

Demonstration of 82% relaxed In0. 18Ga0. 82N on porous GaN pseudo-substrate by plasma-assisted molecular beam epitaxy

Physica Scripta

2023/12/29

Thermal conductivity enhancement of aluminum scandium nitride grown by molecular beam epitaxy

Materials Research Letters

2023/12/2

Heteroepitaxy of N-polar AlN on C-face 4H-SiC: Structural and optical properties

APL Materials

2023/12/1

N-Polar GaN Deep Recess HEMT With Atomic Layer Deposition HfO as Gate Insulator

IEEE Transactions on Electron Devices

2023/7/24

Subhajit Mohanty
Subhajit Mohanty

H-Index: 2

Elaheh Ahmadi
Elaheh Ahmadi

H-Index: 21

Progress and challenges in the development of ultra-wide bandgap semiconductor α-Ga2O3 toward realizing power device applications

2022/12/26

Elaheh Ahmadi
Elaheh Ahmadi

H-Index: 21

Band alignment of sputtered and atomic layer deposited SiO2 and Al2O3 on ScAlN

Journal of Applied Physics

2022/12/15

METHOD TO CONTROL THE RELAXATION OF THICK FILMS ON LATTICE-MISMATCHED SUBSTRATES

2022/12/15

Reconfigurable self-powered deep UV photodetectors based on ultrawide bandgap ferroelectric ScAlN

APL Materials

2022/12/1

See List of Professors in Elaheh Ahmadi University(University of Michigan)

Co-Authors

academic-engine