Riikka Puurunen

Riikka Puurunen

Aalto-yliopisto

H-index: 37

Europe-Finland

About Riikka Puurunen

Riikka Puurunen, With an exceptional h-index of 37 and a recent h-index of 24 (since 2020), a distinguished researcher at Aalto-yliopisto, specializes in the field of atomic layer deposition, catalysis.

His recent articles reflect a diverse array of research interests and contributions to the field:

Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2

Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile

Saturation profile measurement of atomic layer deposited film by X-ray microanalysis on lateral high-aspect-ratio structure

Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition

Conversion of furfural to 2-methylfuran over CuNi catalysts supported on biobased carbon foams

Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2

Hydrodeoxygenation of levulinic acid dimers on a zirconia-supported ruthenium catalyst

Electrically tunable fabry-perot interferometer, an intermediate product an electrode arrangement and a method for producing an electrically tunable fabry-perot interferometer

Riikka Puurunen Information

University

Position

___

Citations(all)

9673

Citations(since 2020)

3790

Cited By

7473

hIndex(all)

37

hIndex(since 2020)

24

i10Index(all)

72

i10Index(since 2020)

56

Email

University Profile Page

Aalto-yliopisto

Google Scholar

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Riikka Puurunen Skills & Research Interests

atomic layer deposition

catalysis

Top articles of Riikka Puurunen

Title

Journal

Author(s)

Publication Date

Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2

The Journal of Physical Chemistry C

Karsten Arts

Sanne Deijkers

Riikka L Puurunen

Wilhelmus MM Kessels

Harm CM Knoops

2021/4/8

Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile

Physical Chemistry Chemical Physics

Jihong Yim

Emma Verkama

Jorge A Velasco

Karsten Arts

Riikka L Puurunen

2022

Saturation profile measurement of atomic layer deposited film by X-ray microanalysis on lateral high-aspect-ratio structure

Applied Surface Science Advances

Eero Haimi

Oili ME Ylivaara

Jihong Yim

Riikka L Puurunen

2021/9/1

Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition

Thin Solid Films

Oili ME Ylivaara

Andreas Langner

Xuwen Liu

Dieter Schneider

Jaakko Julin

...

2021/8/31

Conversion of furfural to 2-methylfuran over CuNi catalysts supported on biobased carbon foams

Catalysis Today

Toni Varila

Eveliina Mäkelä

Riikka Kupila

Henrik Romar

Tao Hu

...

2021/5/1

Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2

Chemistry of Materials

Karsten Arts

Harvey Thepass

Marcel A Verheijen

Riikka L Puurunen

Wilhelmus MM Kessels

...

2021/4/29

Hydrodeoxygenation of levulinic acid dimers on a zirconia-supported ruthenium catalyst

Catalysts

Eveliina Mäkelä

Jose Luis Gonzalez Escobedo

Marina Lindblad

Mats Käldström

Heidi Meriö-Talvio

...

2020/2/7

Electrically tunable fabry-perot interferometer, an intermediate product an electrode arrangement and a method for producing an electrically tunable fabry-perot interferometer

2020/1/23

Hydrodeoxygenation of Propylphenols on a Niobia‐Supported Platinum Catalyst: Ortho, Meta, Para Isomerism, Reaction Conditions, and Phase Equilibria

Advanced Sustainable Systems

José Luis González Escobedo

Eveliina Mäkelä

Jouni Neuvonen

Petri Uusi‐Kyyny

Marina Lindblad

...

2020/10

Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3 and HfO2 (vol 123, pg 27030, 2019)

The Journal of Physical Chemistry C

Karsten Arts

Mikko Utriainen

Riikka L Puurunen

Wilhelmus MM Kessels

Harm CM Knoops

2019/10/16

Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate

Applied Physics Letters

K Arts

JH Deijkers

T Faraz

RL Puurunen

WMM Kessels

...

2020/7/20

Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels

Physical Chemistry Chemical Physics

Jihong Yim

Oili ME Ylivaara

Markku Ylilammi

Virpi Korpelainen

Eero Haimi

...

2020

Liquid–phase Hydrodeoxygenation of 4-Propylphenol to Propylbenzene: Reducible Supports for Pt Catalysts

ChemCatChem

Eveliina Mäkelä

José Luis González Escobedo

Jouni Neuvonen

Jouko Lahtinen

Marina Lindblad

...

2020/5/20

Hydrodeoxygenation Model Compounds γ-Heptalactone and γ-Nonalactone: Density from 293 to 473 K and H2 Solubility from 479 to 582 K

Journal of Chemical & Engineering Data

José Luis González Escobedo

Petri Uusi-Kyyny

Riikka L Puurunen

Ville Alopaeus

2020/4/3

See List of Professors in Riikka Puurunen University(Aalto-yliopisto)

Co-Authors

H-index: 114
Markku Leskela

Markku Leskela

Helsingin yliopisto

H-index: 69
Marcel A Verheijen

Marcel A Verheijen

Technische Universiteit Eindhoven

H-index: 60
Timo Sajavaara

Timo Sajavaara

Jyväskylän yliopisto

H-index: 51
Harri Lipsanen

Harri Lipsanen

Aalto-yliopisto

H-index: 50
Sami Franssila

Sami Franssila

Aalto-yliopisto

H-index: 48
Matti Putkonen

Matti Putkonen

Helsingin yliopisto

academic-engine