Necmi Biyikli

Necmi Biyikli

University of Connecticut

H-index: 40

North America-United States

About Necmi Biyikli

Necmi Biyikli, With an exceptional h-index of 40 and a recent h-index of 28 (since 2020), a distinguished researcher at University of Connecticut, specializes in the field of Atomic Layer Engineering, ALD, Nanoscale Energy Materials, Flexible/Wearable Electronics, III-Nitride and Oxide Semiconductors.

His recent articles reflect a diverse array of research interests and contributions to the field:

Hollow-cathode plasma deposited vanadium oxide films: Metal precursor influence on growth and material properties

Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas

Reducing the β-Ga2O3 Epitaxy Temperature to 240 °C via Atomic Layer Plasma Processing

In situ monitoring atomic layer doping processes for Al-doped ZnO layers: Competitive nature of surface reactions between metal precursors

Excitation wavelength-dependent photoluminescence decay of single quantum dots near plasmonic gold nanoparticles

Real-time in situ process monitoring and characterization of GaN films grown on Si (100) by low-temperature hollow-cathode plasma-atomic layer deposition using trimethylgallium …

Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors

Low-Temperature As-Grown Crystalline β-Ga2O3 Films via Plasma-Enhanced Atomic Layer Deposition

Necmi Biyikli Information

University

Position

___

Citations(all)

5655

Citations(since 2020)

2633

Cited By

4216

hIndex(all)

40

hIndex(since 2020)

28

i10Index(all)

107

i10Index(since 2020)

68

Email

University Profile Page

University of Connecticut

Google Scholar

View Google Scholar Profile

Necmi Biyikli Skills & Research Interests

Atomic Layer Engineering

ALD

Nanoscale Energy Materials

Flexible/Wearable Electronics

III-Nitride and Oxide Semiconductors

Top articles of Necmi Biyikli

Title

Journal

Author(s)

Publication Date

Hollow-cathode plasma deposited vanadium oxide films: Metal precursor influence on growth and material properties

Journal of Vacuum Science & Technology A

Adnan Mohammad

Krishna D Joshi

Dhan Rana

Saidjafarzoda Ilhom

Barrett Wells

...

2024/1/1

Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas

Journal of Vacuum Science & Technology A

Adnan Mohammad

Krishna D Joshi

Dhan Rana

Saidjafarzoda Ilhom

Barrett Wells

...

2023/5/12

Reducing the β-Ga2O3 Epitaxy Temperature to 240 °C via Atomic Layer Plasma Processing

ACS Applied Electronic Materials

Saidjafarzoda Ilhom

Adnan Mohammad

John Grasso

Brian G Willis

Ali K Okyay

...

2022/12/27

In situ monitoring atomic layer doping processes for Al-doped ZnO layers: Competitive nature of surface reactions between metal precursors

Journal of Vacuum Science & Technology A

Adnan Mohammad

Saidjafarzoda Ilhom

Deepa Shukla

Necmi Biyikli

2022/7/1

Excitation wavelength-dependent photoluminescence decay of single quantum dots near plasmonic gold nanoparticles

The Journal of Chemical Physics

Yonglei Sun

Yongchen Wang

Hua Zhu

Na Jin

Adnan Mohammad

...

2022/4/21

Real-time in situ process monitoring and characterization of GaN films grown on Si (100) by low-temperature hollow-cathode plasma-atomic layer deposition using trimethylgallium …

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Deepa Shukla

Adnan Mohammad

Saidjafarzoda Ilhom

Brian G Willis

Ali Kemal Okyay

...

2021/3/12

Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Petro Deminskyi

Ali Haider

Hamit Eren

Talha Masood Khan

Necmi Biyikli

2021/3/29

Low-Temperature As-Grown Crystalline β-Ga2O3 Films via Plasma-Enhanced Atomic Layer Deposition

ACS Applied Materials & Interfaces

Saidjafarzoda Ilhom

Adnan Mohammad

Deepa Shukla

John Grasso

Brian G Willis

...

2021/2/10

Perovskite/perovskite planar tandem solar cells: A comprehensive guideline for reaching energy conversion efficiency beyond 30%

Nano Energy

Mohammad Ismail Hossain

Ahmed M Saleque

Safayet Ahmed

Ilhom Saidjafarzoda

Md Shahiduzzaman

...

2020/10

Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition

Journal of Vacuum Science & Technology A

Saidjafarzoda Ilhom

Deepa Shukla

Adnan Mohammad

John Grasso

Brian Willis

...

2020/3/1

Atomic layer deposition of metal oxides for efficient perovskite single-junction and perovskite/silicon tandem solar cells

RSC advances

Mohammad I Hossain

Adnan Mohammad

Wayesh Qarony

Saidjafarzoda Ilhom

Deepa R Shukla

...

2020

Elucidating the role of nitrogen plasma composition in the low-temperature self-limiting growth of indium nitride thin films

RSC advances

Saidjafarzoda Ilhom

Adnan Mohammad

Deepa Shukla

John Grasso

Brian G Willis

...

2020

Electrospinning Combined with Atomic Layer Deposition to Generate Applied Nanomaterials: A Review

Sesha Vempati

Kugalur Shanmugam Ranjith

Fuat Topuz

Necmi Biyikli

Tamer Uyar

2020/5/12

See List of Professors in Necmi Biyikli University(University of Connecticut)

Co-Authors

H-index: 121
Hadis Morkoç

Hadis Morkoç

Virginia Commonwealth University

H-index: 84
Ekmel Ozbay

Ekmel Ozbay

Bilkent Üniversitesi

H-index: 75
Tamer Uyar, FRSC

Tamer Uyar, FRSC

Cornell University

H-index: 59
M. Selim Ünlü

M. Selim Ünlü

Boston University

H-index: 52
Mustafa O. Guler, PhD, FRSC

Mustafa O. Guler, PhD, FRSC

University of Chicago

H-index: 49
Umit Ozgur

Umit Ozgur

Virginia Commonwealth University

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