Yoshiharu Enta

Yoshiharu Enta

Hirosaki University

H-index: 23

Asia-Japan

About Yoshiharu Enta

Yoshiharu Enta, With an exceptional h-index of 23 and a recent h-index of 7 (since 2020), a distinguished researcher at Hirosaki University,

His recent articles reflect a diverse array of research interests and contributions to the field:

Photovoltaic and mechanical properties of boron carbide films prepared by magnetron sputtering

Hydrogen gas effects on the properties of boron carbide films prepared by magnetron sputtering

Annealing-induced void formation in SiO2 layers on Si substrates: Influence of surface orientation and hydrocarbon exposure

Influence of hydrogen gas flow ratio on the properties of silicon-and nitrogen-doped diamond-like carbon films by plasma-enhanced chemical vapor deposition

Effects of annealing temperature on the mechanical, optical, and electrical properties of hydrogenated, nitrogen-doped diamond-like carbon films

Annealing effects on the properties of hydrogenated diamond-like carbon films doped with silicon and nitrogen

Effects of silicon doping on the chemical bonding states and properties of nitrogen-doped diamond-like carbon films by plasma-enhanced chemical vapor deposition

Effects of H2 and Ar dilution on the optical and electrical properties of Si and N doped diamond-like carbon films by plasma-enhanced chemical vapor deposition

Yoshiharu Enta Information

University

Position

___

Citations(all)

1828

Citations(since 2020)

206

Cited By

1685

hIndex(all)

23

hIndex(since 2020)

7

i10Index(all)

40

i10Index(since 2020)

6

Email

University Profile Page

Hirosaki University

Google Scholar

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Top articles of Yoshiharu Enta

Title

Journal

Author(s)

Publication Date

Photovoltaic and mechanical properties of boron carbide films prepared by magnetron sputtering

Japanese Journal of Applied Physics

Tatsuya Nishida

Masayoshi Sato

Yoshiharu Enta

Yushi Suzuki

Yasuyuki Kobayashi

...

2024/1/9

Hydrogen gas effects on the properties of boron carbide films prepared by magnetron sputtering

IEICE Technical Report; IEICE Tech. Rep.

Nishida Tatsuya

Taniguchi Ryu

Masayoshi Sato

Yasuyuki Kobayashi

Yoshiharu Enta

...

2022/7/28

Annealing-induced void formation in SiO2 layers on Si substrates: Influence of surface orientation and hydrocarbon exposure

Surface Science

Yoshiharu Enta

Yusuke Masuda

Kyota Akimoto

2022/5/1

Influence of hydrogen gas flow ratio on the properties of silicon-and nitrogen-doped diamond-like carbon films by plasma-enhanced chemical vapor deposition

Diamond and Related Materials

Yuya Sasaki

Hiroya Osanai

Yusuke Ohtani

Yuta Murono

Masayoshi Sato

...

2022/3/1

Effects of annealing temperature on the mechanical, optical, and electrical properties of hydrogenated, nitrogen-doped diamond-like carbon films

Thin Solid Films

Hiroya Osanai

Kazuki Nakamura

Yuya Sasaki

Haruto Koriyama

Yasuyuki Kobayashi

...

2022/3/1

Annealing effects on the properties of hydrogenated diamond-like carbon films doped with silicon and nitrogen

Diamond and Related Materials

Hideki Nakazawa

Kazuki Nakamura

Hiroya Osanai

Yuya Sasaki

Haruto Koriyama

...

2022/2/1

Effects of silicon doping on the chemical bonding states and properties of nitrogen-doped diamond-like carbon films by plasma-enhanced chemical vapor deposition

Thin Solid Films

K Nakamura

H Ohashi

Y Enta

Y Kobayashi

Y Suzuki

...

2021/10/31

Effects of H2 and Ar dilution on the optical and electrical properties of Si and N doped diamond-like carbon films by plasma-enhanced chemical vapor deposition

IEICE Technical Report; IEICE Tech. Rep.

Yuya Sasaki

Hiroya Osanai

Yusuke Ohtani

Yuta Murono

Masayoshi Sato

...

2021/10/20

Hydrogen effects on the properties of BCN films deposited by magnetron sputtering

電子情報通信学会技術研究報告 (Web)

Ryu Taniguchi

HARUTO KOORIYAMA

Yasuyuki Kobayashi

Yoshiharu Enta

Hirokazu Fukidome

...

2020

See List of Professors in Yoshiharu Enta University(Hirosaki University)