Toshikazu Nishida

Toshikazu Nishida

University of Florida

H-index: 52

North America-United States

About Toshikazu Nishida

Toshikazu Nishida, With an exceptional h-index of 52 and a recent h-index of 25 (since 2020), a distinguished researcher at University of Florida,

His recent articles reflect a diverse array of research interests and contributions to the field:

Methods and apparatuses for hollow and multi-material stereolithography

Automated Phase and Orientation Mapping of Multiphase, Polycrystalline Hafnia-Zirconia Thin Films Using 4D-STEM

A Comparison of Relative Seebeck Coefficients for Screen Printed Flexible Thermocouples Using Commercially Available Conductive Inks

3D printing of hollow geometries using blocking liquid substitution stereolithography

Ferroelectricity and thermal retention through in situ hydrogen plasma treatment of doped hafnium oxide

Hafnium-zirconium oxide (HZO) ferroelectric transducer and method of making the same

Thermal retention of atomic layer deposited Hf0. 5Zr0. 52 films using H2O and O2–H2 plasma oxidation methods

Preisach modeling of imprint on hafnium zirconium oxide ferroelectric capacitors

Toshikazu Nishida Information

University

Position

___

Citations(all)

9801

Citations(since 2020)

2795

Cited By

7974

hIndex(all)

52

hIndex(since 2020)

25

i10Index(all)

129

i10Index(since 2020)

68

Email

University Profile Page

University of Florida

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Top articles of Toshikazu Nishida

Title

Journal

Author(s)

Publication Date

Methods and apparatuses for hollow and multi-material stereolithography

2023/8/17

Automated Phase and Orientation Mapping of Multiphase, Polycrystalline Hafnia-Zirconia Thin Films Using 4D-STEM

Garrett Baucom

Eitan Hershkovitz

Kartik Sondhi

Toshikazu Nishida

Honggyu Kim

2023/8/1

A Comparison of Relative Seebeck Coefficients for Screen Printed Flexible Thermocouples Using Commercially Available Conductive Inks

Cameron Anderson

Z Hugh Fan

Jorg Richstein

Mark Sussman

Toshikazu Nishida

2023/7/9

3D printing of hollow geometries using blocking liquid substitution stereolithography

Scientific Reports

Aftab A Bhanvadia

Richard T Farley

Youngwook Noh

Toshikazu Nishida

2023/1/9

Ferroelectricity and thermal retention through in situ hydrogen plasma treatment of doped hafnium oxide

2022/8/23

Hafnium-zirconium oxide (HZO) ferroelectric transducer and method of making the same

2022/7/19

Thermal retention of atomic layer deposited Hf0. 5Zr0. 52 films using H2O and O2–H2 plasma oxidation methods

Applied Physics Letters

Glen Walters

Paul Chojecki

Zane Forrester

Toshikazu Nishida

2021/1/18

Preisach modeling of imprint on hafnium zirconium oxide ferroelectric capacitors

Journal of Applied Physics

Paul Chojecki

Glen Walters

Zane Forrester

Toshikazu Nishida

2021/9/7

High-resolution stereolithography using a static liquid constrained interface

Communications Materials

Aftab A Bhanvadia

Richard T Farley

Youngwook Noh

Toshikazu Nishida

2021/4/9

Fabrication and non-destructive characterization of through-plastic-via (TPV) in flexible hybrid electronics

Flexible and Printed Electronics

Kartik Sondhi

Sai Guruva Reddy Avuthu

Jörg Richstein

Z Hugh Fan

Toshikazu Nishida

2021/3/25

A High- 30nm-Thick MFM Resonator Using Ferroelectric Hafnium Zirconium Oxide

Mayur Ghatge

Glen Walters

Toshikazu Nishida

Roozbeh Tabrizian

2020/1/18

Effect of a Backing Material on the Bendability of Flexible Substrates with Passive SMD components

Kartik Sondhi

Sai Guruva Reddy Avuthu

Nathaniel Richards

Z Hugh Fan

Toshikazu Nishida

2020/6/3

Screen-printable and stretchable hard magnetic ink formulated from barium hexaferrite nanoparticles

Journal of Materials Chemistry C

Connor S Smith

Kartik Sondhi

Sara C Mills

Jennifer S Andrew

Z Hugh Fan

...

2020

Microfluidic paper-based analytical device for histidine determination

Applied Biochemistry and Biotechnology

Akimitsu Kugimiya

Akane Fujikawa

Xiao Jiang

Z Hugh Fan

Toshikazu Nishida

...

2020/11

Screen-printed inductive silver ink strain sensor on stretchable tpu substrate

Connor S Smith

Kartik Sondhi

Beatriz Jimenez

Z Hugh Fan

Toshikazu Nishida

...

2020/6/3

Three-dimensional fabrication at inert immiscible liquid interface

2020/10/15

A 30-nm thick integrated hafnium zirconium oxide nano-electro-mechanical membrane resonator

Applied Physics Letters

M Ghatge

G Walters

T Nishida

R Tabrizian

2020/1/27

Effect of forming gas furnace annealing on the ferroelectricity and wake-up effect of Hf0. 5Zr0. 5O2 thin films

ECS Journal of Solid State Science and Technology

Aniruddh Shekhawat

Glen Walters

Ching-Chang Chung

Roberto Garcia

Yang Liu

...

2020/1/24

Multi-material microstereolithography using injection of resin

2020/9/3

Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films

Applied Physics Letters

Glen Walters

Aniruddh Shekhawat

Saeed Moghaddam

Jacob L Jones

Toshikazu Nishida

2020/1/21

See List of Professors in Toshikazu Nishida University(University of Florida)