Tahsin Faraz
Technische Universiteit Eindhoven
H-index: 15
Europe-Netherlands
Top articles of Tahsin Faraz
Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors
ACS Applied Materials & Interfaces
2022/3/21
Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al (CH3) 3
Applied Physics Letters
2020/10/19
Area-selective atomic layer deposition of TiN using aromatic inhibitor molecules for metal/dielectric selectivity
Chemistry of Materials
2020/8/13
Tahsin Faraz
H-Index: 8
Marcel A Verheijen
H-Index: 43
Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
Applied Physics Letters
2020/7/20
Etching with atomic-level precision: The emerging field of atomic layer etching
2020/6/2
Tahsin Faraz
H-Index: 8
Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
Plasma Chemistry and Plasma Processing
2020/5
Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study
Nanoscale
2020
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