Harm Knoops
Technische Universiteit Eindhoven
H-index: 37
Europe-Netherlands
Top articles of Harm Knoops
Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma
Journal of Vacuum Science & Technology A
2023/12/1
Haozhe Wang
H-Index: 8
Harm Knoops
H-Index: 30
Ultrathin superconducting TaCxN1− x films prepared by plasma-enhanced atomic layer deposition with ion-energy control
Applied Physics Letters
2023/9/25
Marcel A Verheijen
H-Index: 43
Harm Knoops
H-Index: 30
Isotropic atomic layer etching of GaN using SF6 plasma and Al (CH3) 3
Journal of Applied Physics
2023/8/21
Yi Shu
H-Index: 16
Harm Knoops
H-Index: 30
Recent Material Developments for Superconducting Quantum Circuits
2023
Circle fit optimization for resonator quality factor measurements
APS March Meeting Abstracts
2023
Isotropic Atomic Layer Etching of TiN by Oxidation to TiO2 and Selective Etching of TiO2 by SF6 and H2 Plasma
APS March Meeting Abstracts
2023
Haozhe Wang
H-Index: 8
Harm Knoops
H-Index: 30
(Invited) The Use of Plasmas for Isotropic Atomic Layer Etching
Electrochemical Society Meeting Abstracts 244
2023/12/22
Harm Knoops
H-Index: 30
Adrie Mackus
H-Index: 21
Surface smoothing by atomic layer deposition and etching for the fabrication of nanodevices
ACS Applied Nano Materials
2022/11/28
Foundations of atomic-level plasma processing in nanoelectronics
Plasma Sources Science and Technology
2022/10/25
Plasma-Enhanced Atomic Layer Deposition of Superconducting Tantalum Carbonitride for Quantum Devices
Journal of Vacuum Science & Technology A
2017/1/1
Innovative remote plasma source for atomic layer deposition for GaN devices
Journal of Vacuum Science & Technology A
2021/12/1
Plasma‐Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
Advanced Materials Technologies
2021/11
(Invited) Role of Low-Energy Ions during Plasma-Enhanced Atomic Layer Deposition
Electrochemical Society Meeting Abstracts 240
2021/10/19
Karsten Arts
H-Index: 5
Harm Knoops
H-Index: 30
Surface zeta potential and diamond growth on gallium oxide single crystal
Carbon
2021/8/30
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
Chemistry of Materials
2021/4/29
Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
The Journal of Physical Chemistry C
2021/4/8
Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
The Journal of Physical Chemistry C
2021/2/10
Plasma atomic layer deposition
Atomic layer deposition of nanostructured materials
2011/11/23
Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
Nanoscale
2021
Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al (CH3) 3
Applied Physics Letters
2020/10/19
