Tae Joo Park

Tae Joo Park

Hanyang University

H-index: 36

Asia-South Korea

About Tae Joo Park

Tae Joo Park, With an exceptional h-index of 36 and a recent h-index of 26 (since 2020), a distinguished researcher at Hanyang University, specializes in the field of Atomic layer deposition, 2-dimensional electron gas, Powder-ALD, Microbattery, Neuromorphic devices.

His recent articles reflect a diverse array of research interests and contributions to the field:

Towards modeling of ZrO2 atomic layer deposition at reactor scale based on experimental kinetic approximation

Reduced leakage current in atomic-layer-deposited HfO2 thin films deposited at low temperature by in-situ defect passivation

Resistive switching element and memory device including the same

Systematically designed g-C3N4/rGO/MoS2 nanocomposite for enhanced photocatalytic performance

Formation of oxygen vacancy at surfaces of ZnO by trimethylaluminum

Synchronized wet-chemical development of 2-dimensional MoS2 and g-C3N4/MoS2 QDs nanocomposite as efficient photocatalysts for detoxification of aqueous dye solutions

Atomic Layer Deposition of Ru Thin Film Using a Newly Synthesized Precursor with Open‐Coordinated Ligands

Method for forming a composite metal film using atomic layer deposition

Tae Joo Park Information

University

Position

___

Citations(all)

4614

Citations(since 2020)

2385

Cited By

2727

hIndex(all)

36

hIndex(since 2020)

26

i10Index(all)

107

i10Index(since 2020)

75

Email

University Profile Page

Hanyang University

Google Scholar

View Google Scholar Profile

Tae Joo Park Skills & Research Interests

Atomic layer deposition

2-dimensional electron gas

Powder-ALD

Microbattery

Neuromorphic devices

Top articles of Tae Joo Park

Title

Journal

Author(s)

Publication Date

Towards modeling of ZrO2 atomic layer deposition at reactor scale based on experimental kinetic approximation

Applied Surface Science

Nhat-Minh Phung

Minh-Tan Ha

Si-Young Bae

Soonil Lee

Tae-Joo Park

...

2024/2/15

Reduced leakage current in atomic-layer-deposited HfO2 thin films deposited at low temperature by in-situ defect passivation

Applied Surface Science

Suyeon Kim

Seung-Hun Lee

In Ho Jo

Tae Joo Park

Jeong Hwan Kim

2024/2/1

Resistive switching element and memory device including the same

2024/1/9

Systematically designed g-C3N4/rGO/MoS2 nanocomposite for enhanced photocatalytic performance

Current Applied Physics

Waseem Sardar

Gohar Ali

Fengchun Jiang

Ahmad Nawaz

Salman Khan

...

2024/1/1

Formation of oxygen vacancy at surfaces of ZnO by trimethylaluminum

APL Materials

Hyobin Eom

Woojin Bae

Ju Young Sung

Ji Hyeon Choi

Kyun Seong Dae

...

2024/3/1

Synchronized wet-chemical development of 2-dimensional MoS2 and g-C3N4/MoS2 QDs nanocomposite as efficient photocatalysts for detoxification of aqueous dye solutions

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Aleena Azhar

Muhammad Abdul Basit

Waqar Mehmood

Muhammad Aanish Ali

Saira Zahid

...

2023/1/20

Atomic Layer Deposition of Ru Thin Film Using a Newly Synthesized Precursor with Open‐Coordinated Ligands

Advanced Materials Interfaces

Seung Hoon Oh

Jeong Min Hwang

Hyeonbin Park

Dongseong Park

Young Eun Song

...

2023/6

Method for forming a composite metal film using atomic layer deposition

2023/8/24

Physicochemically tailored Ag2S QDs deposition on ZnO for improved photocatalytic and antibacterial performance

Materials Today Communications

Syed Jazib Abbas Zaidi

Summal Zoha

Muneeb Ahmad

Muhammad Shahid

Tae Joo Park

...

2023/12/1

Effective strategies for improved optoelectronic properties of graphitic carbon nitride: A review

Aleena Azhar

Muhammad Aanish Ali

Ijaz Ali

Tae Joo Park

Muhammad Abdul Basit

2023/1/1

Near-Total-Reflection Hard X-ray Photoemission Study on Al2O3/TiO2 2-dimensional Electron Gas System

APS March Meeting Abstracts

Yejin Kim

Cheng-Tai Kuo

Jean-Pascal Rueff

Masato Yoshimura

Ji Hyeon Choi

...

2023

Method of operating selector device, method of operating nonvolatile memory apparatus applying the same, electronic circuit device including selector device, and nonvolatile …

2023/11/28

Transition metal-dichalcogenide thin film and manufacturing method therefor

2023/5/16

Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition

The Journal of Physical Chemistry Letters

Hong Keun Chung

Han Kim

Jihoon Jeon

Sung-Chul Kim

Sung Ok Won

...

2023/7/13

Advanced atomic layer deposition (ALD): controlling the reaction kinetics and nucleation of metal thin films using electric-potential-assisted ALD

Journal of Materials Chemistry C

Ji Won Han

Hyun Soo Jin

Yoon Jeong Kim

Ji Sun Heo

Woo-Hee Kim

...

2023

Epitaxial growth of NbN thin films for electrodes using atomic layer deposition

Applied Surface Science

Seo Young Jang

Hye Min Lee

Ju Young Sung

Se Eun Kim

Jae Deock Jeon

...

2023/11/1

Advanced Atomic Layer Deposition: Ultrathin metal film growth using discrete feeding ALD and electric potential assisted ALD

한국표면공학회 학술발표회 초록집

Ji Won Han

Hyun Soo Jin

Yoon Jeong Kim

Ji Sun Heo

Woo-Hee Kim

...

2023/5

Grain boundary engineering strategy for simultaneously reducing the electron concentration and lattice thermal conductivity in n-type Bi2Te2. 7Se0. 3-based thermoelectric materials

Journal of the European Ceramic Society

Seunghyeok Lee

Sung-Jin Jung

Gwang Min Park

Junpyo Hong

Albert S Lee

...

2023/7/1

Antiviral role of nanomaterials: a material scientist's perspective

Muhammad Aanish Ali

Nagina Rehman

Tae Joo Park

Muhammad Abdul Basit

2023

Selective Dissolution‐Derived Nanoporous Design of Impurity‐Free Bi2Te3 Alloys with High Thermoelectric Performance

Small

Seunghyeok Lee

Sung‐Jin Jung

Gwang Min Park

Min Young Na

Kwang‐Chon Kim

...

2023/4

See List of Professors in Tae Joo Park University(Hanyang University)