Sarit Dhar

Sarit Dhar

Auburn University

H-index: 39

North America-United States

About Sarit Dhar

Sarit Dhar, With an exceptional h-index of 39 and a recent h-index of 21 (since 2020), a distinguished researcher at Auburn University, specializes in the field of Silicon Carbide, Semiconductors, MOSFET, interfaces.

His recent articles reflect a diverse array of research interests and contributions to the field:

Trap passivation of 4H-SiC/SiO2 interfaces by nitrogen annealing

Zadek Osteotomy, a Good Treatment Option for Refractory Haglund’s Deformity

Nitrogen Annealing As a Sustainable Method for Interface Trap Passivation in 4H-SiC Mosfets

Study of carrier mobilities in 4H-SiC MOSFETS using Hall analysis

(Invited, Digital Presentation) Interface Charge Trapping and Scattering in SiC MOSFET Channels

Nitrogen‐Induced Changes in the Electronic and Structural Properties of 4H‐SiC (0001)/SiO2 Interfaces

High conductivity β-Ga2O3 formed by hot Si ion implantation

Effect of surface treatments on ALD Al2O3/4H-SiC metal–oxide–semiconductor field-effect transistors

Sarit Dhar Information

University

Position

Associate Professor of Physics

Citations(all)

4314

Citations(since 2020)

1723

Cited By

3620

hIndex(all)

39

hIndex(since 2020)

21

i10Index(all)

67

i10Index(since 2020)

41

Email

University Profile Page

Google Scholar

Sarit Dhar Skills & Research Interests

Silicon Carbide

Semiconductors

MOSFET

interfaces

Top articles of Sarit Dhar

Title

Journal

Author(s)

Publication Date

Trap passivation of 4H-SiC/SiO2 interfaces by nitrogen annealing

Journal of Applied Physics

Suman Das

Hengfei Gu

Lu Wang

Ayayi Ahyi

Leonard C Feldman

...

2023/6/7

Zadek Osteotomy, a Good Treatment Option for Refractory Haglund’s Deformity

Cureus

Yiteng Xu

Zulfiqar A Haider

Vail Karuppiah

Sunil Dhar

Zulfiqar Haider

2023/5/25

Nitrogen Annealing As a Sustainable Method for Interface Trap Passivation in 4H-SiC Mosfets

Electrochemical Society Meeting Abstracts 242

Suman Das

Hengfei Gu

Lu Wang

Ayayi Ahyi

Leonard C Feldman

...

2022/10/9

Study of carrier mobilities in 4H-SiC MOSFETS using Hall analysis

Materials

Suman Das

Yongju Zheng

Ayayi Ahyi

Marcelo A Kuroda

Sarit Dhar

2022/9/28

(Invited, Digital Presentation) Interface Charge Trapping and Scattering in SiC MOSFET Channels

Electrochemical Society Meeting Abstracts 241

Sarit Dhar

Suman Das

Ayayi Ahyi

Marcelo Kuroda

2022/7/7

Nitrogen‐Induced Changes in the Electronic and Structural Properties of 4H‐SiC (0001)/SiO2 Interfaces

physica status solidi (b)

Lu Wang

Sarit Dhar

Leonard C Feldman

Marcelo A Kuroda

2022/2

High conductivity β-Ga2O3 formed by hot Si ion implantation

Applied Physics Letters

Arka Sardar

Tamara Isaacs-Smith

Jacob Lawson

Thaddeus Asel

Ryan B Comes

...

2022/12/26

Effect of surface treatments on ALD Al2O3/4H-SiC metal–oxide–semiconductor field-effect transistors

Journal of Applied Physics

IU Jayawardhena

RP Ramamurthy

D Morisette

AC Ahyi

R Thorpe

...

2021/2/21

Electron beam-induced crystallization of Al2O3 gate layer on β-Ga2O3 MOS capacitors

Micron

Christopher J Klingshirn

Asanka Jayawardena

Sarit Dhar

Rahul P Ramamurthy

Dallas Morisette

...

2021/1/1

Interface States Passivation for p-Channel 4H-SiC MOS Devices

Electrochemical Society Meeting Abstracts 240

Suman Das

Tamara Isaacs-smith

Ayayi Ahyi

Marcelo Kuroda

Sarit Dhar

2021/10/19

High dose gamma irradiation effects on properties of active layers in ZnO thin film transistors

Semiconductor Science and Technology

Vahid Mirkhani

Shiqiang Wang

Kosala Yapabandara

Muhammad Shehzad Sultan

Min Prasad Khanal

...

2021/9/21

Analytical electron microscopy of ((2) over-bar01) beta-Ga2O3/SiO2 and ((2) over-bar01) beta-Ga2O3/Al2O3 interface structures in MOS capacitors

JOURNAL OF APPLIED PHYSICS

Christopher J Klingshirn

Asanka Jayawardena

Sarit Dhar

Rahul P Ramamurthy

Dallas Morisette

...

2021/5/21

Analytical electron microscopy of (2¯ 01) β-Ga2O3/SiO2 and (2¯ 01) β-Ga2O3/Al2O3 interface structures in MOS capacitors

Journal of Applied Physics

Christopher J Klingshirn

Asanka Jayawardena

Sarit Dhar

Rahul P Ramamurthy

Dallas Morisette

...

2021/5/21

High temperature characteristics of nitric oxide annealed p-channel 4H-SiC metal oxide semiconductor field effect transistors

Journal of Applied Physics

Suman Das

Tamara Isaacs-Smith

Ayayi Ahyi

Marcelo A Kuroda

Sarit Dhar

2021/12/14

See List of Professors in Sarit Dhar University(Auburn University)