Mikhail Krishtab
Katholieke Universiteit Leuven
H-index: 17
Europe-Belgium
Top articles of Mikhail Krishtab
Title | Journal | Author(s) | Publication Date |
|---|---|---|---|
Area-selective deposition and bottom-up approaches: an overview of applications in IC manufacturing | Silvia Armini Mikhail Krishtab Mattia Pasquali Jayant Kumar Lodha Annelies Delabie | 2024/4/10 | |
Resistless patterning mask | 2024/3/5 | ||
Inorganic capping layers in advanced photosensitive polymer based RDL processes: processing and reliability | Nelson Pinho Emmanuel Chery Ritwik Bhatia Ganesh Sundaram John Slabbekoorn | 2023/5/30 | |
Low-k materials engineering for 10 nm technology node and beyond | Mikhail Krishtab | 2022/11/21 | |
Cyclic plasma halogenation of amorphous carbon for defect-free area-selective atomic layer deposition of titanium oxide | ACS Applied Materials & Interfaces | Mikhail Krishtab Silvia Armini Johan Meersschaut Stefan De Gendt Rob Ameloot | 2021/6/23 |
Porosimetry: Porosimetry for Thin Films of Metal–Organic Frameworks: A Comparison of Positron Annihilation Lifetime Spectroscopy and Adsorption‐Based Methods (Adv. Mater. 17/2021) | Advanced Materials | Timothée Stassin Rhea Verbeke Alexander John Cruz Sabina Rodríguez‐Hermida Ivo Stassen | 2021/4 |
Porosimetry for Thin Films of Metal–Organic Frameworks: A Comparison of Positron Annihilation Lifetime Spectroscopy and Adsorption‐Based Methods | Timothée Stassin Rhea Verbeke Alexander John Cruz Sabina Rodríguez‐Hermida Ivo Stassen | 2021/4 | |
Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide | Mikhail Krishtab Joey Hung Roy Koret Igor Turovets Kavita Shah | 2020 | |
Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration | Materials Advances | Ivan Zyulkov Ekaterina Voronina Mikhail Krishtab Dmitry Voloshin BT Chan | 2020 |
Selective deposition of metal-organic frameworks | 2020/6/16 | ||
Plasma halogenated aC: H as growth inhibiting layer for ASD of titanium oxide | M Krishtab J Hung R Koret I Turovets K Shah | 2020/5/15 |
Co-Authors
