Mikael Östling

Mikael Östling

Kungliga Tekniska högskolan

H-index: 53

Europe-Sweden

About Mikael Östling

Mikael Östling, With an exceptional h-index of 53 and a recent h-index of 29 (since 2020), a distinguished researcher at Kungliga Tekniska högskolan, specializes in the field of Nanoelectronics, Device technology, power devices.

His recent articles reflect a diverse array of research interests and contributions to the field:

Semiconductor devices for lasing applications and methods of manufacturing such devices

Sequential 3D Integration of Ge Transistors on Si CMOS

Photodetectors Based on Emerging Materials

Improvement on Ge/GeOx/Tm2O3/HfO2 Gate Performance by Forming Gas Anneal

Growth of epitaxial SiGe alloys as etch-stop layers in germanium-on-insulator fabrication

Si-Passivated Ge Gate Stacks with Low Interface State and Oxide Trap Densities Using Thulium Silicate

Manufacture and characterization of graphene membranes with suspended silicon proof masses for MEMS and NEMS applications

Selective Epitaxial Growth of In Situ Doped SiGe on Bulk Ge for p+/n Junction Formation

Mikael Östling Information

University

Position

___

Citations(all)

14169

Citations(since 2020)

4692

Cited By

11617

hIndex(all)

53

hIndex(since 2020)

29

i10Index(all)

296

i10Index(since 2020)

80

Email

University Profile Page

Kungliga Tekniska högskolan

Google Scholar

View Google Scholar Profile

Mikael Östling Skills & Research Interests

Nanoelectronics

Device technology

power devices

Top articles of Mikael Östling

Title

Journal

Author(s)

Publication Date

Semiconductor devices for lasing applications and methods of manufacturing such devices

2021/4/8

Sequential 3D Integration of Ge Transistors on Si CMOS

ECS Transactions

Mikael Ostling

Per-Erik Hellstrom

2023/9/29

Photodetectors Based on Emerging Materials

Jiantong Li

Mikael Östling

2022/11/11

Improvement on Ge/GeOx/Tm2O3/HfO2 Gate Performance by Forming Gas Anneal

Laura Žurauskaitė

Mikael Östling

Per-Erik Hellström

2021/9/13

Growth of epitaxial SiGe alloys as etch-stop layers in germanium-on-insulator fabrication

Ahmad Abedin

Konstantinos Garidis

Ali Asadollahi

Per-Erik Hellström

Mikael Östling

2021

Si-Passivated Ge Gate Stacks with Low Interface State and Oxide Trap Densities Using Thulium Silicate

ECS Transactions

Laura Zurauskaite

Ahmad Abedin

Per-Erik Hellström

Mikael Östling

2020/9/8

Manufacture and characterization of graphene membranes with suspended silicon proof masses for MEMS and NEMS applications

Microsystems & Nanoengineering

Xuge Fan

Anderson D Smith

Fredrik Forsberg

Stefan Wagner

Stephan Schröder

...

2020/4/20

Selective Epitaxial Growth of In Situ Doped SiGe on Bulk Ge for p+/n Junction Formation

Electronics

Konstantinos Garidis

Ahmad Abedin

Ali Asadollahi

Per-Erik Hellström

Mikael Östling

2020/3/29

A silicon carbide 256 pixel UV image sensor array operating at 400° C

IEEE Journal of the Electron Devices Society

Shuoben Hou

Muhammad Shakir

Per-Erik Hellström

Bengt Gunnar Malm

Carl-Mikael Zetterling

...

2020/1/14

Process Conditions for Low Interface State Density in Si-passivated Ge Devices with TmSiO Interfacial Layer

ECS Journal of Solid State Science and Technology

L Žurauskaitė

P-E Hellström

Mikael Östling

2020/12/29

(G03 Best Paper Award Winner) Si-Passivated Ge Gate Sacks with Low Interface State and Oxide Trap Densities Using Thulium Silicate

Electrochemical Society Meeting Abstracts prime2020

Laura Zurauskaite

Ahmad Abedin

Per-Erik Hellström

Mikael Östling

2020/11/23

See List of Professors in Mikael Östling University(Kungliga Tekniska högskolan)