Junghwan Kim

About Junghwan Kim

Junghwan Kim, With an exceptional h-index of 20 and a recent h-index of 20 (since 2020), a distinguished researcher at Tokyo Institute of Technology, specializes in the field of Electronic Materials and Devices.

His recent articles reflect a diverse array of research interests and contributions to the field:

Approach to Low Contact Resistance Formation on Buried Interface in Oxide Thin-Film Transistors: Utilization of Palladium-Mediated Hydrogen Pathway

Approaches for 3D Integration Using Plasma-Enhanced Atomic-Layer-Deposited Atomically-Ordered InGaZnO Transistors with Ultra-High Mobility

Selectively Nitrogen doped ALD-IGZO TFTs with extremely high mobility and reliability

P‐8: Synthesis of Superior‐Performance InGaZnO Based on Ideal Reaction of Plasma Enhanced Atomic Layer Deposition†

Role of hydrogen-doping for compensating oxygen-defect in non-stoichiometric amorphous In2O3− x: Modeling with a machine-learning potential

Room-Temperature Solid-State Synthesis of Cs3Cu2I5 Thin Films and Formation Mechanism for Its Unique Local Structure

Novel Self-aligned Passivation Process for Oxide TFTs utilizing Amorphous Gallium Oxide

Electronic promotion of methanol synthesis over Cu-loaded ZnO-based catalysts

Junghwan Kim Information

University

Position

___

Citations(all)

2118

Citations(since 2020)

1953

Cited By

725

hIndex(all)

20

hIndex(since 2020)

20

i10Index(all)

32

i10Index(since 2020)

24

Email

University Profile Page

Google Scholar

Junghwan Kim Skills & Research Interests

Electronic Materials and Devices

Top articles of Junghwan Kim

Title

Journal

Author(s)

Publication Date

Approach to Low Contact Resistance Formation on Buried Interface in Oxide Thin-Film Transistors: Utilization of Palladium-Mediated Hydrogen Pathway

ACS nano

Yuhao Shi

Masatake Tsuji

Hanjun Cho

Shigenori Ueda

Junghwan Kim

...

2024/3/22

Approaches for 3D Integration Using Plasma-Enhanced Atomic-Layer-Deposited Atomically-Ordered InGaZnO Transistors with Ultra-High Mobility

Small methods

Yoon-Seo Kim

Hye-Jin Oh

Junghwan Kim

Jun Hyung Lim

Jin-Seong Park

2023/7

Selectively Nitrogen doped ALD-IGZO TFTs with extremely high mobility and reliability

ACS Applied Materials & Interfaces

Dong-Gyu Kim

Hyuk Choi

Yoon-Seo Kim

Dong-Hyeon Lee

Hye-Jin Oh

...

2023/6/23

P‐8: Synthesis of Superior‐Performance InGaZnO Based on Ideal Reaction of Plasma Enhanced Atomic Layer Deposition†

SID Symposium Digest of Technical Papers

Yoon-Seo Kim

Hye-Jin Oh

Junghwan Kim

Jun Hyung Lim

Jin-Seong Park

2023/6

Role of hydrogen-doping for compensating oxygen-defect in non-stoichiometric amorphous In2O3− x: Modeling with a machine-learning potential

Journal of Applied Physics

Shingo Urata

Nobuhiro Nakamura

Junghwan Kim

Hideo Hosono

2023/9/21

Room-Temperature Solid-State Synthesis of Cs3Cu2I5 Thin Films and Formation Mechanism for Its Unique Local Structure

Journal of the American Chemical Society

Masatake Tsuji

Masato Sasase

Soshi Iimura

Junghwan Kim

Hideo Hosono

2023/5/16

Novel Self-aligned Passivation Process for Oxide TFTs utilizing Amorphous Gallium Oxide

Yuhao Shi

Junghwan Kim

Hideo Hosono

2023/7/4

Electronic promotion of methanol synthesis over Cu-loaded ZnO-based catalysts

The Journal of Physical Chemistry Letters

Hironobu Sugiyama

Nobuhiro Nakamura

Satoru Watanabe

Junghwan Kim

Masaaki Kitano

...

2023/1/31

A Strategy for High-Mobility and Highly-Stable Oxide TFTs

Junghwan Kim

Yu-Shien Shiah

Kihyung Sim

Hideo Hosono

2023/7/4

Hole Concentration Reduction in CuI by Zn Substitution and its Mechanism: Toward Device Applications

ACS Applied Materials & Interfaces

Masatake Tsuji

Soshi Iimura

Junghwan Kim

Hideo Hosono

2022/7/13

Extremely Shallow Valence Band in Lanthanum Trihydride

Journal of the American Chemical Society

Tomoyuki Yamasaki

Soshi Iimura

Junghwan Kim

Hideo Hosono

2022/12/21

18‐Crown‐6 Additive to Enhance Performance and Durability in Solution‐Processed Halide Perovskite Electronics

Small

Kihyung Sim

Takuya Nakao

Masato Sasase

Soshi Iimura

Junghwan Kim

...

2022/8

Breaking the Mobility-Stability Trade-Off in Oxide TFTs

Proceedings of the International Display Workshops

Kim Junghwan

Shiah Yu-Shien

Abe Katsumi

Hosono Hideo

2022/12/14

Carbon‐Related Impurities and NBS Instability in AOS‐TFTs

Amorphous Oxide Semiconductors: IGZO and Related Materials for Display and Memory

Junghwan Kim

Hideo Hosono

2022/8/1

Experimental demonstration of high-order in-memory computing based on IGZO charge trapping RAM array for polynomial regression acceleration

Lin Bao

Zongwei Wang

Yuhao Shi

Yaotian Ling

Yunfan Yang

...

2022/12/3

Rare Earth–and Transition Metal–Doped Amorphous Oxide Semiconductor Phosphors for Novel Light‐Emitting Diode Displays

Amorphous Oxide Semiconductors: IGZO and Related Materials for Display and Memory

Keisuke Ide

Junghwan Kim

Hideo Hosono

Toshio Kamiya

2022/8/1

High-performance a-ITZO TFTs with high bias stability enabled by self-aligned passivation using a-GaOx

Applied Physics Letters

Yuhao Shi

Yu-Shien Shiah

Kihyung Sim

Masato Sasase

Junghwan Kim

...

2022/11/21

Application of AOSs to Charge Transport Layers in Electroluminescent Devices

Amorphous Oxide Semiconductors: IGZO and Related Materials for Display and Memory

Junghwan Kim

Hideo Hosono

2022/8/1

Low-temperature-processable amorphous-oxide-semiconductor-based phosphors for durable light-emitting diodes

Applied Physics Letters

Keisuke Ide

Naoto Watanabe

Takayoshi Katase

Masato Sasase

Junghwan Kim

...

2022/11/7

Characteristic resistive switching of rare-earth oxyhydrides by hydride ion insertion and extraction

ACS applied materials & interfaces

Tomoyuki Yamasaki

Ryosei Takaoka

Soshi Iimura

Junghwan Kim

Hidenori Hiramatsu

...

2022/4/19

See List of Professors in Junghwan Kim University(Tokyo Institute of Technology)

Co-Authors

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