H.V. Jansen (Henri)
Universiteit Twente
H-index: 47
Europe-Netherlands
Top articles of H.V. Jansen (Henri)
Title | Journal | Author(s) | Publication Date |
|---|---|---|---|
Nanometer-scale photon confinement in topology-optimized dielectric cavities | Nature Communications | Marcus Albrechtsen Babak Vosoughi Lahijani Rasmus Ellebæk Christiansen Vy Thi Hoang Nguyen Laura Nevenka Casses | 2022/10/21 |
Tailoring a nanometer-scale fabrication process for silicon photonics | Marcus Albrechtsen Ali Nawaz Babar Babak Vosoughi Lahijani Evgeniy Shkondin Guillermo Arregui Bravo | 2022 | |
Measuring propagation losses of edge modes in photonic topological insulators | Christian Anker Rosiek Marcus Albrechtsen Anastasiia Vladimirova Henri Jansen | 2022 | |
Nanometer-scale photon confinement inside dielectrics | arXiv preprint arXiv:2108.01681 | Marcus Albrechtsen Babak Vosoughi Lahijani Rasmus Ellebæk Christiansen Vy Thi Hoang Nguyen Laura Nevenka Casses | 2021/8/3 |
Cr and CrOx etching using SF6 and O2 plasma | Journal of Vacuum Science & Technology B | Vy Thi Hoang Nguyen Flemming Jensen Jörg Hübner Evgeniy Shkondin Roy Cork | 2021/5/1 |
Shot-filling effects in nanometer-scale electron-beam lithography | Marcus Albrechtsen Babak Vosoughi Lahijani Rasmus Ellebæk Christiansen Vy Thi Hoang Nguyen Laura Nevenka Casses | 2021 | |
High-resolution etching of nanophotonic cavities using a chromium hard mask | Ali Nawaz Babar Marcus Albrechtsen Babak Vosoughi Lahijani Rasmus Ellebæk Christiansen Jesper Mørk | 2021 | |
Fabrication and characterization of topology-optimized photonic cavities with deep subwavelength confinement | M Albrechtsen B Vosoughi Lahijani RE Christiansen VTH Nguyen O Sigmund | 2020/7/13 | |
On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand | Journal of Vacuum Science & Technology A | Vy Thi Hoang Nguyen Flemming Jensen Jörg Hübner Pele Leussink Henri Jansen | 2020/7/1 |
Deep reactive ion etching of ‘grass-free’widely-spaced periodic 2D arrays, using sacrificial structures | Microelectronic Engineering | Chantal M Silvestre Vy Nguyen Henri Jansen Ole Hansen | 2020/2/15 |
The CORE sequence: A nanoscale fluorocarbon-free silicon plasma etch process based on SF6/O2 cycles with excellent 3D profile control at room temperature | ECS Journal of Solid State Science and Technology | Vy Thi Hoang Nguyen Chantal Silvestre Peixiong Shi Roy Cork Flemming Jensen | 2020/1/7 |
On the formation of black silicon in SF | Vy Thi Hoang Nguyen Flemming Jensen Jörg Hübner Pele Leussink Henri Jansen | 2020 | |
Ultrahigh aspect ratio etching of silicon in SF6-O2 plasma: The clear-oxidize-remove-etch (CORE) sequence and chromium mask | Journal of Vacuum Science & Technology A | Vy Thi Hoang Nguyen Evgeniy Shkondin Flemming Jensen Jörg Hübner Pele Leussink | 2020/9/1 |
