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Xiaoming Yang

About Xiaoming Yang

Xiaoming Yang, With an exceptional h-index of 4 and a recent h-index of 4 (since 2020), a distinguished researcher at Nanyang Technological University, specializes in the field of material science, surface engineering, semiconductor processing.

His recent articles reflect a diverse array of research interests and contributions to the field:

Multiple patterning with self-alignment provided by spacers

Air gap regions of a semiconductor device

A novel technique to fabricate magnetic polydimethylsiloxane micropillar

Gate cut first isolation formation with contact forming process mask protection

Xiaoming Yang Information

University

Position

___

Citations(all)

127

Citations(since 2020)

82

Cited By

76

hIndex(all)

4

hIndex(since 2020)

4

i10Index(all)

3

i10Index(since 2020)

2

Email

University Profile Page

Google Scholar

Xiaoming Yang Skills & Research Interests

material science

surface engineering

semiconductor processing

Top articles of Xiaoming Yang

Multiple patterning with self-alignment provided by spacers

2021/6/15

Air gap regions of a semiconductor device

2021/5/25

A novel technique to fabricate magnetic polydimethylsiloxane micropillar

Journal of Applied Polymer Science

2021/5/20

Xiaoming Yang
Xiaoming Yang

H-Index: 3

Gate cut first isolation formation with contact forming process mask protection

2020/11/3

See List of Professors in Xiaoming Yang University(Nanyang Technological University)