Masashi Kato

About Masashi Kato

Masashi Kato, With an exceptional h-index of 17 and a recent h-index of 13 (since 2020), a distinguished researcher at Nagoya Institute of Technology, specializes in the field of Physics, Electronics, Semiconductors, Silicon carbide.

His recent articles reflect a diverse array of research interests and contributions to the field:

Effects of proton implantation into 4H-SiC substrate: Stacking faults in epilayer on the substrate

Analysis of defects dominating carrier recombination in CeO2 single crystal for photocatalytic applications

Photoelectrical characterization of heavily-doped p-SiC Schottky contacts

Mitigation of carrier trapping effects on carrier lifetime measurements with continuous-wave laser illumination for Pb-based metal halide perovskite materials

Surface recombination velocities for 4H–SiC: Dependence of excited carrier concentration and surface passivation

Effect of dislocations on carrier recombination and photoelectrochemical activity in polished and unpolished TiO2 and SrTiO3 crystals

Effects of proton implantation for expansion of basal plane dislocations in SiC toward suppression of bipolar degradation: review and perspective

Carrier recombination in highly Al doped 4H-SiC: dependence on the injection conditions

Masashi Kato Information

University

Position

___

Citations(all)

1074

Citations(since 2020)

617

Cited By

663

hIndex(all)

17

hIndex(since 2020)

13

i10Index(all)

40

i10Index(since 2020)

25

Email

University Profile Page

Google Scholar

Masashi Kato Skills & Research Interests

Physics

Electronics

Semiconductors

Silicon carbide

Top articles of Masashi Kato

Effects of proton implantation into 4H-SiC substrate: Stacking faults in epilayer on the substrate

Materials Science in Semiconductor Processing

2024/6/1

Masashi Kato
Masashi Kato

H-Index: 11

Shunta Harada
Shunta Harada

H-Index: 14

Analysis of defects dominating carrier recombination in CeO2 single crystal for photocatalytic applications

Journal of Physics D: Applied Physics

2024/4/24

Masashi Kato
Masashi Kato

H-Index: 11

Photoelectrical characterization of heavily-doped p-SiC Schottky contacts

Japanese Journal of Applied Physics

2024/3/12

Masashi Kato
Masashi Kato

H-Index: 11

Mitigation of carrier trapping effects on carrier lifetime measurements with continuous-wave laser illumination for Pb-based metal halide perovskite materials

Journal of Applied Physics

2024/2/21

Masashi Kato
Masashi Kato

H-Index: 11

Surface recombination velocities for 4H–SiC: Dependence of excited carrier concentration and surface passivation

Materials Science in Semiconductor Processing

2024/2/1

Masashi Kato
Masashi Kato

H-Index: 11

Lei Han
Lei Han

H-Index: 2

Effect of dislocations on carrier recombination and photoelectrochemical activity in polished and unpolished TiO2 and SrTiO3 crystals

Journal of Applied Physics

2024/1/28

Mingxin Zhang
Mingxin Zhang

H-Index: 0

Masashi Kato
Masashi Kato

H-Index: 11

Effects of proton implantation for expansion of basal plane dislocations in SiC toward suppression of bipolar degradation: review and perspective

2024/1/15

Masashi Kato
Masashi Kato

H-Index: 11

Shunta Harada
Shunta Harada

H-Index: 14

Carrier recombination in highly Al doped 4H-SiC: dependence on the injection conditions

Japanese Journal of Applied Physics

2024/1/10

Kazuhiro Tanaka
Kazuhiro Tanaka

H-Index: 1

Masashi Kato
Masashi Kato

H-Index: 11

Unravelling material properties of halide perovskites by combined microwave photoconductivity and time-resolved photoluminescence spectroscopy

Journal of Materials Chemistry C

2024

Karen Forberich
Karen Forberich

H-Index: 31

Masashi Kato
Masashi Kato

H-Index: 11

Analysis of carrier recombination coefficients of 3C-and 6H-SiC: Insights into recombination mechanisms in stacking faults of 4H-SiC

AIP Advances

2023/8/1

Kazuhiro Tanaka
Kazuhiro Tanaka

H-Index: 1

Masashi Kato
Masashi Kato

H-Index: 11

Development of an angle detection system for channeling implantation to the c-axis of SiC using birefringence phenomenon

Japanese Journal of Applied Physics

2023/6/22

Masashi Kato
Masashi Kato

H-Index: 11

Suppression of partial dislocation glide motion during contraction of stacking faults in SiC epitaxial layers by hydrogen ion implantation

Applied Physics Express

2023/1/23

Shunta Harada
Shunta Harada

H-Index: 14

Masashi Kato
Masashi Kato

H-Index: 11

Effects of ion implantation process on defect distribution in SiC SJ-MOSFET

Japanese Journal of Applied Physics

2023/1/25

Masashi Kato
Masashi Kato

H-Index: 11

4H-SiC Auger recombination coefficient under the high injection condition

Japanese Journal of Applied Physics

2023/1/10

Kazuhiro Tanaka
Kazuhiro Tanaka

H-Index: 1

Masashi Kato
Masashi Kato

H-Index: 11

Mechanochemical Synthesis of Cesium Titanium Halide Perovskites Cs2TiBr6‐xIx (x = 0, 2, 4, 6)

Crystal Research and Technology

2023/1

Masashi Kato
Masashi Kato

H-Index: 11

Analysis of carrier lifetime in a drift layer of 1.2-kV class 4H–SiC devices toward complete suppression of bipolar degradation

Materials Science in Semiconductor Processing

2023/1/1

Shunta Harada
Shunta Harada

H-Index: 14

Masashi Kato
Masashi Kato

H-Index: 11

Vascular endothelium as a target tissue for short-term exposure to low-frequency noise that increases cutaneous blood flow

Science of the Total Environment

2022/12/10

Surface recombination velocities for the (100) and (001) crystal faces of bismuth vanadate single crystals

Journal of Physics D: Applied Physics

2022/12/8

Masashi Kato
Masashi Kato

H-Index: 11

Characterization of defect structure in epilayer grown on on-axis sic by synchrotron X-ray topography

Journal of Electronic Materials

2022/4

Masashi Kato
Masashi Kato

H-Index: 11

Trapping effects and surface/interface recombination of carrier recombination in single-or poly-crystalline metal halide perovskites

Japanese Journal of Applied Physics

2022/11/22

Masashi Kato
Masashi Kato

H-Index: 11

See List of Professors in Masashi Kato University(Nagoya Institute of Technology)