Joakim Andersson

About Joakim Andersson

Joakim Andersson, With an exceptional h-index of 25 and a recent h-index of 15 (since 2020), a distinguished researcher at Uppsala Universitet, specializes in the field of Thin film deposition, metal plasma generation, metal ion soucre design, physical vapor deposition, chemical vapor deposition.

His recent articles reflect a diverse array of research interests and contributions to the field:

High power impulse magnetron sputtering of diamond-like carbon coatings

Resonant inelastic x-ray scattering on : Parity conservation in inversion-symmetric polyatomics

Joakim Andersson Information

University

Position

Researcher Division of Solid State Electronics

Citations(all)

3374

Citations(since 2020)

934

Cited By

2827

hIndex(all)

25

hIndex(since 2020)

15

i10Index(all)

40

i10Index(since 2020)

19

Email

University Profile Page

Google Scholar

Joakim Andersson Skills & Research Interests

Thin film deposition

metal plasma generation

metal ion soucre design

physical vapor deposition

chemical vapor deposition

Top articles of Joakim Andersson

High power impulse magnetron sputtering of diamond-like carbon coatings

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

2020/7/8

Resonant inelastic x-ray scattering on : Parity conservation in inversion-symmetric polyatomics

Physical Review A

2020/6/1

See List of Professors in Joakim Andersson University(Uppsala Universitet)

Co-Authors

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