Jin-Goo Park
Hanyang University
H-index: 28
Asia-South Korea
Top articles of Jin-Goo Park
Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing
Solid State Phenomena
2023/9/14
Pinpoint Particle Removal for EUV Pellicle Productivity Enhancement
Solid State Phenomena
2023/9/14
Acoustic power dependent detachment of PSL particles adhered to glass surfaces by dissolved gas and anionic surfactant in an ultrasonic field
Colloids and Surfaces A: Physicochemical and Engineering Aspects
2023/8/20
Benzethonium chloride as a tungsten corrosion inhibitor in neutral and alkaline media for the post-chemical mechanical planarization application
Journal of Colloid and Interface Science
2023/8/1
Sumit Kumar
H-Index: 1
Jin-Goo Park
H-Index: 16
Effect of ammonium halide salts on wet chemical nanoscale etching and polishing of InGaAs surfaces for advanced CMOS devices
Materials Science in Semiconductor Processing
2023/3
Pellicle cleaning apparatus and pellicle cleaning method using the same
2023/6/29
Removal behavior of Sn and Pb contaminants on EUV mask after EUV exposure
2022/12/1
Jin-Goo Park
H-Index: 16
Effect of slurry particles on PVA brush contamination during post-CMP cleaning
Materials Science in Semiconductor Processing
2022/8
Effect of Slurry Additives on Co-BTA Complex Stability and Inhibition Property During Co CMP Process
ECS Journal of Solid State Science and Technology
2022/8/22
Samrina Sahir
H-Index: 2
Jin-Goo Park
H-Index: 16
Method and apparatus for cleaning PVA brush
2022/7/12
Theoretical validation of inhibition mechanisms of benzotriazole with copper and cobalt for CMP and post-CMP cleaning applications
Microelectronic Engineering
2022/6/1
Chi Ho Lee
H-Index: 12
Sang Uck Lee
H-Index: 20
Nagendra Prasad Yerriboina
H-Index: 7
Jin-Goo Park
H-Index: 16
Effect of pH and Ion Concentration on Wetting of Nanoholes and Water Structuring
ECS Transactions
2022/5/20
Jin-Goo Park
H-Index: 16
Effect of Skin Layer on Brush Loading, Cross-Contamination, and Cleaning Performance during Post-CMP Cleaning
ECS Journal of Solid State Science and Technology
2022/5/3
Study on PVA brush loading and conditioning during shallow trench isolation post-CMP cleaning process
ECS Journal of Solid State Science and Technology
2022/2/11
Latest developments in the understanding of PVA brush related issues during post CMP (pCMP) cleaning
2022/1/1
Nagendra Prasad Yerriboina
H-Index: 7
Jin-Goo Park
H-Index: 16
Particle Removal by Surfactants During Semiconductor Cleaning
2022/1/1
Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant
Ultrasonics Sonochemistry
2022/1
Effects of H2O2 and pH on the Chemical Mechanical Planarization of Molybdenum
ECS Journal of Solid State Science and Technology
2021/9/24
Jin-Goo Park
H-Index: 16
Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning
Applied Surface Science
2021/4/15
Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning
Microelectronic Engineering
2021/3/15
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