Dane Sievers
University of Illinois at Urbana-Champaign
H-index: 7
North America-United States
Top articles of Dane Sievers
Plasma‐Damage Free Efficiency Scaling of Micro‐LEDs by Metal‐Assisted Chemical Etching
Advanced Optical Materials
2024
Uniform broad-area deposition and patterning of SiO2 nanofilms by 172 nm photochemical conversion of liquid tetraethoxysilane layers at 300 K
APL Materials
2024/1/1
Publisher's Note:“Programmable vapor-phase metal-assisted chemical etching for versatile high-aspect ratio silicon nanomanufacturing”[Appl. Phys. Rev. 10, 011409 (2023)]
Applied Physics Reviews
2023/6/3
Programmable vapor-phase metal-assisted chemical etching for versatile high-aspect ratio silicon nanomanufacturing
Applied Physics Reviews
2023/3/13
Commercialization of microcavity plasma devices and arrays: Systems for VUV photolithography and nanopatterning, disinfection of drinking water and air, and biofilm …
2022/10
Photoresist-free deposition and patterning with vacuum ultraviolet lamps
2022/7/14
Methods and systems for large area and low defect monolayer ordering of microspheres and nanospheres
2022/6/23
Photoablative lithography of cellulose acetate at 172 nm: Subtractive 3D printing of biodegradable optical microstructures and molds for polydimethylsiloxane patterning
APL Materials
2021/11/1
Photoresist-free photolithography, photoprocessing tools, and methods with vuv or deep-uv lamps
2021/10/28
Eco-friendly 3D micromachining of polymers by 172 nm photoablation for optical and microfluidics applications
2021/8/1
Producing silicon carbide micro and nanostructures by plasma‐free metal‐assisted chemical etching
Advanced Functional Materials
2021/8
Arrays of microplasma-assisted atomic layer deposition and etching free patterning of Ga2O3 thin film with flexible DUV photodetector
2021/5/9
Fabrication of optical components and micro-and nanofluidic devices in polymers by 172 nm direct photoablation
2021/3/5
Microplasma-Driven Atomic Layer Deposition of Aluminum Oxide Etch-Free Patterning, and Gallium Oxide-Based Flexible DUV Photodetector
APS Annual Gaseous Electronics Meeting Abstracts
2021
Catalyst-assisted chemical etching with a vapor-phase etchant
2020/8/18
172 nm patterning of optical components on polymers (Conference Presentation)
2020/3/10
Monolithic mtesla-level magnetic induction by self-rolled-up membrane technology
Science advances
2020/1/17
Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin …
Nanoscale
2020
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